Luogo di origine: | Shanghai |
Marca: | SIGNI |
Certificazione: | ISO |
Numero di modello: | SiO2 |
Imballaggi particolari: | Cartone |
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Termini di pagamento: | T/T, L/C, PAYPAL, UNIONE AD OVEST |
application: | Pezzo in lavorazione di lucidatura, vetro, alto grado del nuovo tipo con il cristallo di cristallo d | Qualità: | Alto |
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Evidenziare: | SiO2 70nm silicon wafer polishing,20%wt silicon wafer polishing,20%wt diamond polishing powder |
Silicon Oxide SiO2 polishing slurry for sapphire, aluminium, oxide, ceramic, stainless steel
Selecting fine lodox as the raw material, adopt diversified formulation design, our SiO2 Slurry are widely used for the grinding and precision polishing of compound crystals, optical device, LCD panel, gemstone, metal workpiece and so on.
Characteristics:
Uniform particle size.
High polishing efficiency.
Strict production technology control and scientific testing methods ensure the stability of product quality.
Available Specifications
Specifications
|
LSI80
|
LSI120
|
Size(nm)
|
70-90
|
100-120
|
Appearance |
Micro blue liquid
|
Micro blue liquid
|
Solid content(%wt)
|
20~40
|
20~40
|
PH
|
10.0~11.0
|
10.0~11.0
|
specific gravity |
1.10~1.30
|
1.10~1.30
|
Viscosity(cp)
|
≤10
|
≤10
|
Remarks: Special sizes can be tailor-made.
Application:
1. Semiconductor wafer processing: such as sapphire substrate, SiC wafer and sapphire window film.
2. Ceramic processing: such as Zirconia fingerprint identification chip, Zirconia ceramic mobile phone back cover and other functional ceramics.
3. Metal processing: such as stainless steel, die steel, aluminum alloy and other metal materials.
4. Other materials processing: optical glass, hard alloy, etc.
Persona di contatto: Zhao
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